SinoPure™ Ultra-H2O2 overcomes sub-nanometer metal ion chelating distillation and multi-stage resin ion-exchange barriers. Reliably supplied to leading global semiconductor foundries for wafer wet processing.
CAS: 7722-84-1
31.0% ± 0.5%
Ultra-Pure Electronic Grade Hydrogen Peroxide (SEMI C12)
Product Overview & Characteristics
Key Technical Advantages:
Single metallic ion impurity < 10 ppt (parts-per-trillion), world-class purity
Particle count control (≥ 0.1μm) < 10 pcs/mL
Ultra-low anionic and total organic carbon impurities (TOC < 5 ppm)
Enclosed maglev cleanroom filling system with nitrogen positive pressure protection
Typical Technical Specifications
| Property | Typical Value | Test Standard |
|---|---|---|
| Metallic Cations (Fe, Cu, Ni, Na, etc.) | < 10 ppt per element | ICP-MS |
| Chloride (Cl⁻) | < 10 ppb | IC |
| Sulfate (SO₄²⁻) | < 10 ppb | IC |
| Particle Count (≥ 0.1 μm) | ≤ 8 pcs/mL | LPC |
Target Industries & Applications
7nm / 5nm Advanced Logic Chip Wafer Wet Cleaning
3D NAND Flash Memory High-Aspect-Ratio Photoresist Stripping
Advanced Packaging CMP Slurry Oxidizing Agent
Packaging & Delivery Options
200L PFA Ultra-Pure Drums
20,000L PFA Lined ISO Tank Containers
Storage: Cool, ventilated warehouse below 25°C, away from combustible agents